CHEMICAL BATH DEPOSITION OF STRONTIUM FLOURIDE (SrF2) THIN FILMS AT DIFFERENT MOLAR CONCENTRATIONS

ABSTRACT

Semiconductor thin films of Strontium Fluoride (SrF2) were successfully deposited on glass substrates at room temperature, using an improved solution growth technique at different bath concentrations. A 756S UV-VIS Spectrophotometer was used to obtain the spectra absorbance data, while the other optical and solid-state properties of the films were obtained by calculations based on theory. The average optical and solid properties include: absorbance (A) = 0.000 - 0.004, transmittance (T) = 1.000 - 1.001, Reflectance (R) = 0.000 - 0.005, absorbing power (a) = 0.000 x 10% ml - 0.001 x 10° m', Film thickness (t) = 1.0010 - 2.0081 and bandgap (Eg) = 2.500 - 2.700eV.